Publication Information

Title:
Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B117 (2017)
Date:
2016-11-16

Author Information

Name Institution
Sebastian FrankeTechnische Universität Braunschweig
Matthias BaumkötterTechnische Universität Braunschweig
Carsten MonkaTechnische Universität Braunschweig
Sebastian RaabeTechnische Universität Braunschweig
Reinhard CasparyTechnische Universität Braunschweig
Hans-Hermann JohannesTechnische Universität Braunschweig
Wolfgang KowalskyTechnische Universität Braunschweig
Sebastian BeckUniversity of Heidelberg
Annemarie PucciUniversity of Heidelberg
Hassan GargouriSentech Instruments GmbH

Films

Thermal Al2O3


Thermal Al2O3


Plasma Al2O3

Hardware used: Custom Spatial


CAS#: 7782-44-7

CAS#: 7440-59-7

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Si(100)

Keywords

Diffusion Barrier
Plasma vs Thermal Comparison

Notes

839