Publication Information

Title: Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources

Type: Journal

Info: Journal of Vacuum Science & Technology A 35, 01B117 (2017)

Date: 2016-11-16

DOI: http://dx.doi.org/10.1116/1.4971173

Author Information

Name

Institution

Technische Universität Braunschweig

Technische Universität Braunschweig

Technische Universität Braunschweig

Technische Universität Braunschweig

Technische Universität Braunschweig

Technische Universität Braunschweig

Technische Universität Braunschweig

University of Heidelberg

University of Heidelberg

Sentech Instruments GmbH

Films

Thermal Al2O3 using Custom Spatial

Deposition Temperature = 100C

75-24-1

7732-18-5

Thermal Al2O3 using Custom Spatial

Deposition Temperature Range = 50-150C

75-24-1

10028-15-6

Plasma Al2O3 using Custom Spatial

Deposition Temperature = 100C

75-24-1

7782-44-7

7440-59-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Sopra GESP5

Refractive Index

Ellipsometry

Sopra GESP5

Density

XRR, X-Ray Reflectivity

PANalytical Empyrean

Chemical Composition, Impurities

FTIR, Fourier Transform InfraRed spectroscopy

Bruker Vertex 80V

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Plasma Species

OES, Optical Emission Spectroscopy

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Si(100)

Keywords

Diffusion Barrier

Plasma vs Thermal Comparison

Notes

839



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