Plasma ALD, LLC Consulting

Your search for publications using this chemistry returned 11 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
2	AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
3	Working gas effect on properties of Al₂O₃ film in plasma-enhanced atomic layer deposition
4	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
5	Si atomic layer epitaxy based on Si₂H₆ and remote He plasma bombardment
6	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
7	Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
8	A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
9	Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
10	Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
11	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition