Publication Information

Title:
Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 619 (2016) 342-346
Date:
2016-10-20

Author Information

Name Institution
M. HurKorea Institute of Machinery and Materials
J.Y. LeeKorea Institute of Machinery and Materials
W. S. KangKorea Institute of Machinery and Materials
J. O. LeeKorea Institute of Machinery and Materials
Y.-H. SongKorea Institute of Machinery and Materials
S. J. KimKorea Advanced Institute of Science and Technology
I. D. KimKorea Advanced Institute of Science and Technology

Films

Plasma Al2O3


Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

Silicon

Keywords

Notes

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