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Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 619 (2016) 342-346
Date:
2016-10-20
Author Information
| Name | Institution |
|---|---|
| M. Hur | Korea Institute of Machinery and Materials |
| J.Y. Lee | Korea Institute of Machinery and Materials |
| W. S. Kang | Korea Institute of Machinery and Materials |
| J. O. Lee | Korea Institute of Machinery and Materials |
| Y.-H. Song | Korea Institute of Machinery and Materials |
| S. J. Kim | Korea Advanced Institute of Science and Technology |
| I. D. Kim | Korea Advanced Institute of Science and Technology |
Films
Plasma Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Substrates
| Silicon |
Notes
| 977 |