Publication Information

Title:
Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 30, 051807 (2012)
Date:
2012-08-23

Author Information

Name Institution
Chiyu ZhuArizona State University
David J. SmithArizona State University
Robert J. NemanichArizona State University

Films

Plasma ZnO



Plasma ZnO



Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Valence Band
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Substrates

Si(100)

Keywords

Notes

631