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HfLaOx Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing HfLaOx films returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
2Characteristics of high-k dielectric ECR-ALD lanthanum hafnium oxide (LHO) films
3Comparison of the Deposition Characteristics and Electrical Properties for La2O3, HfO2 and LHO Films
4Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
5Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties
6Properties of HfLaO MOS capacitor deposited on SOI with plasma enhanced atomic layer deposition

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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