In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 02D401 (2018)
Date:
2018-01-08

Author Information

Name Institution
Ganna ChistiakovaHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Mathias MewsHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Regan G. WilksHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Marcus BärHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Lars KorteHelmholtz-Zentrum Berlin für Materialien und Energie GmbH

Films

Plasma SnO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Band Gap
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Mercury Probe

Substrates

Si-H
Corning XG Glass

Notes

1291