Publication Information

Title: In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition

Type: Journal

Info: Journal of Vacuum Science & Technology A 36, 02D401 (2018)

Date: 2018-01-08

DOI: http://dx.doi.org/10.1116/1.5015967

Author Information

Name

Institution

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Helmholtz-Zentrum Berlin für Materialien und Energie GmbH

Films

Plasma SnO2 using Unknown

Deposition Temperature Range = 90-210C

1066-77-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

SENTECH SE850

Band Gap

Ellipsometry

SENTECH SE850

Refractive Index

Ellipsometry

SENTECH SE850

Chemical Binding

XPS, X-ray Photoelectron Spectroscopy

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Resistivity, Sheet Resistance

Mercury Probe

-

Substrates

Si-H

Corning XG Glass

Keywords

Solar

Notes

1291



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