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Atomic layer deposition of thin films as model electrodes: A case study of the synergistic effect in Fe2O3-SnO2

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 37, 050904 (2019)
Date:
2019-08-09
DOI:
http://dx.doi.org/10.1116/1.5115987

Author Information

Name Institution
Jeroen KintGhent University
Felix MattelaerGhent University
Matthias M. MinjauwGhent University
Bo ZhaoGhent University
Christophe DetavernierGhent University

Films

Thermal SnO2

Hardware used: Custom Remote Inductively Coupled Plasma
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 100C

Plasma Fe2O3

Hardware used: Custom Remote Inductively Coupled Plasma
t-Butylferrocene, (TBF), (t-BuCp)2Fe
CAS#: 1316-98-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Other FeSnO

Hardware used: Custom Remote Inductively Coupled Plasma
t-Butylferrocene, (TBF), (t-BuCp)2Fe
CAS#: 1316-98-9
Where to buy precursor
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Discover

Characteristic: Chemical Composition, Impurities
Analysis: XRF, X-Ray Fluorescence
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: FEI Quanta 200 FEG

Characteristic: Electrochemical Performance
Analysis: Custom
Diagnostic: Custom

Substrates

SiO2
Pt

Notes

1510