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Publication Information

Title: Low-temperature plasma-enhanced atomic layer deposition of tin oxide electron selective layers for highly efficient planar perovskite solar cells

Type: Journal

Info: J. Mater. Chem. A, 2016, 4, 12080-12087

Date: 2016-07-09

DOI: http://dx.doi.org/10.1039/C6TA04503K

Author Information

Name

Institution

University of Toledo

University of Toledo

University of Toledo

University of Toledo

University of Toledo

University of Toledo

University of Toledo

University of Toledo

Southeast University

Wuhan University

Wuhan University

Wuhan University

University of Toledo

Wuhan University

University of Toledo

Films

Plasma SnO2 using Ensure LabNano PE

Deposition Temperature Range = 50-200C

1066-77-9

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Photoluminescence

PL, PhotoLuminescence

Horiba Symphony-II

Images

SEM, Scanning Electron Microscopy

Unknown

Thickness

Ellipsometry

J.A. Woollam M-2000FI

Open Circuit Voltage

Custom

Custom

Short Circuit Current

Custom

Custom

Fill Factor

Custom

Custom

Efficiency

Custom

Custom

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Instruments Nanoscope V

Resistivity, Sheet Resistance

Four-point Probe

Lucas Labs PRO4-440N

Substrates

ITO

FTO, F:SnO2

Keywords

Solar

Notes

874



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