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Plasma treatment to tailor growth and photoelectric performance of plasma-enhanced atomic layer deposition SnOx infrared transparent conductive thin films

Type:
Journal
Info:
Surface & Coatings Technology 403 (2020) 126414
Date:
2020-09-10
DOI:
https://doi.org/10.1016/j.surfcoat.2020.126414

Author Information

Name Institution
Liangge XuHarbin Institute of Technology
Lili HeHarbin Institute of Technology
Lei YangHarbin Institute of Technology
Zhibo ZhangHarbin Institute of Technology
Shuai GuoHarbin Institute of Technology
Zhenhuai YangHarbin Institute of Technology
Peng WangHarbin Institute of Technology
Fangjuan GengHarbin Institute of Technology
Gang GaoHarbin Institute of Technology
Chunqiang SunHarbin Institute of Technology
Victor RalchenkoHarbin Institute of Technology
Jiaqi ZhuHarbin Institute of Technology

Films

Plasma SnO2

Hardware used: Ensure LabNano PE
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 100-250C

Plasma SnO2

Hardware used: Ensure LabNano PE
TDMASn, (Me2N)4Sn, [(CH3)2N]4Sn, Tetrakis(DiMethylAmido) Tin, Tin Dimethylamide
CAS#: 1066-77-9
O2, Oxygen
CAS#: 7782-44-7
Ar, Argon
CAS#: 7440-37-1
Deposition Temperature Range = 100-250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: -
Diagnostic: -

Characteristic: Refractive Index
Analysis: -
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Ultra 55

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Ultra 55

Characteristic: Transmittance
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Perkin Elmer 5100

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: -

Characteristic: Mobility
Analysis: Hall Measurements
Diagnostic: Ecopia HMS-3000

Characteristic: Carrier Concentration
Analysis: Hall Measurements
Diagnostic: Ecopia HMS-3000

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Diagnostic: Ecopia HMS-3000

Characteristic: Electromagnetic Shielding
Analysis: Vector Network Analysis
Diagnostic: Keysight Technologies N5234A

Characteristic: Stress
Analysis: Stress Measurement
Diagnostic: SuPro Instruments FST2000

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Silicon
Quartz
Sapphire

Notes

1599