
RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
Type:
Journal
Info:
229th ECS Meeting
Date:
2016-05-30
Author Information
Name | Institution |
---|---|
Kensaku Kanomata | Yamagata University |
K. Tokoro | Yamagata University |
Takahiro Imai | Yamagata University |
P. Pungboon Pansila | Yamagata University |
Masanori Miura | Yamagata University |
Bashir Ahmmad | Yamagata University |
Shigeru Kubota | Yamagata University |
Kazuhiro Hirahara | Yamagata University |
Fumihiko Hirose | Yamagata University |
Films
Film/Plasma Properties
Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Thickness
Analysis: Ellipsometry
Substrates
Si(100) |
Notes
767 |