Publication Information

Title: RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor

Type: Journal

Info: 229th ECS Meeting

Date: 2016-05-30

DOI: https://ecs.confex.com/ecs/229/webprogram/Paper69956.html

Author Information

Name

Institution

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Yamagata University

Films

Plasma ZrO2 using Custom

Deposition Temperature = 25C

175923-04-3

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Deposition Kinetics, Reaction Mechanism

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Thickness

Ellipsometry

Unknown

Substrates

Si(100)

Keywords

High-k Dielectric Thin Films

Notes

767



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