Publication Information

Title:
RT Atomic Layer Deposition of ZrO2 By Using Plasma Excited Water Vapor
Type:
Journal
Info:
229th ECS Meeting
Date:
2016-05-30

Author Information

Name Institution
Kensaku KanomataYamagata University
K. TokoroYamagata University
Takahiro ImaiYamagata University
P. Pungboon PansilaYamagata University
Masanori MiuraYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University
Kazuhiro HiraharaYamagata University
Fumihiko HiroseYamagata University

Films


Film/Plasma Properties

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Thickness
Analysis: Ellipsometry

Substrates

Si(100)

Keywords

High-k Dielectric Thin Films

Notes

767