Publication Information

Title:
Room-temperature atomic layer deposition of ZrO2 using tetrakis(ethylmethylamino)zirconium and plasma-excited humidified argon
Type:
Journal
Info:
Applied Surface Science 387 (2016) 497 - 502
Date:
2016-06-21

Author Information

Name Institution
Kensaku KanomataYamagata University
K. TokoroYamagata University
Takahiro ImaiYamagata University
P. Pungboon PansilaYamagata University
Masanori MiuraYamagata University
Bashir AhmmadYamagata University
Shigeru KubotaYamagata University
Kazuhiro HiraharaYamagata University
Fumihiko HiroseYamagata University

Films


Film/Plasma Properties

Characteristic: Deposition Kinetics, Reaction Mechanism
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy

Substrates

Keywords

Reaction Mechanism

Notes

965