Publication Information

Title:
Infrared study on room-temperature atomic layer deposition of HfO2 using tetrakis(ethylmethylamino)hafnium and remote plasma-excited oxidizing agents
Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-10-10

Author Information

Name Institution
Kensaku KanomataYamagata University

Films



Film/Plasma Properties

Substrates

Keywords

Notes

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