Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor

Type:
Journal
Info:
Applied Surface Science Volume 308, 30 July 2014, Pages 328-332
Date:
2014-04-24
DOI:
http://dx.doi.org/10.1016/j.apsusc.2014.04.166

Author Information

Name Institution
Kensaku KanomataYamagata University

Films

Plasma TiO2

Hardware used: Custom
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: IRAS, Infrared Reflection Absorption Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: JASCO M-220

Substrates

Notes

Low temperature TiO2 PEALD with TDMAT and H2O plasma.
264