Publication Information

Title: Infrared Study on Room-temperature Atomic Layer Deposition of TiO2 Using Tetrakis(dimethylamino)titanium and Remote-Plasma Excited Water Vapor

Type: Journal

Info: Applied Surface Science Volume 308, 30 July 2014, Pages 328-332

Date: 2014-04-24

DOI: http://dx.doi.org/10.1016/j.apsusc.2014.04.166

Author Information

Name

Institution

Yamagata University

Films

Plasma TiO2 using Custom

Deposition Temperature = 25C

3275-24-9

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Surface Reactions

IRAS, Infrared Reflection Absorption Spectroscopy

Unknown

Thickness

Ellipsometry

JASCO M-220

Substrates

Keywords

Low-Temperature

Notes

Low temperature TiO2 PEALD with TDMAT and H2O plasma.

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