
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
Type:
Journal
Info:
RSC Adv., 2021, 11, 12235-12248
Date:
2021-03-09
Author Information
Name | Institution |
---|---|
Mengmeng Miao | University of Alberta |
Kenneth C. Cadien | University of Alberta |
Films
Plasma AlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Substrates
Si(100) |
Notes
Nice discussion and analysis of in situ ellipsometry results. |
1554 |