AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms

Type:
Journal
Info:
RSC Adv., 2021, 11, 12235-12248
Date:
2021-03-09

Author Information

Name Institution
Mengmeng MiaoUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films

Plasma AlN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Substrates

Si(100)

Keywords

Reaction Mechanism

Notes

Nice discussion and analysis of in situ ellipsometry results.
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