Publication Information

Title:
Bipolar resistive switching properties of AlN films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Surface Science Volume 315, 1 October 2014, Pages 110-115
Date:
2014-07-19

Author Information

Name Institution
Jian ZhangZhejiang University

Films

Plasma AlN


Film/Plasma Properties

Substrates

Keywords

Resistance RAM

Notes

243