Publication Information

Title:
Influence of atomic layer deposition valve temperature on ZrN plasma enhanced atomic layer deposition growth
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 33, 060603 (2015)
Date:
2015-06-24

Author Information

Name Institution
Triratna MuneshwarUniversity of Alberta
Kenneth C. CadienUniversity of Alberta

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance

Substrates

Si(111)
SiO2

Keywords

Notes

369