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An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy

Type:
Journal
Info:
ChemSusChem, Volume 8, Issue 2, pages 361-376, January 2015
Date:
2014-10-24
DOI:
http://dx.doi.org/10.1002/cssc.201402704

Author Information

Name Institution
XueHai TanUniversity of Alberta

Films

Plasma TiON

Hardware used: Oxford Instruments FlexAL
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

CNTs, Carbon NanoTubes

Notes

Oxford Instruments FlexAL PEALD TiON for catalyst interlayer study.
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