2021 Year in Review
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203 Films Compositions
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
Type:
Journal
Info:
Chem. Mater. 2017, 29, 998-1005
Date:
2017-01-09
Author Information
| Name | Institution |
|---|---|
| Elisa Atosuo | University of Helsinki |
| Miia Mäntymäki | University of Helsinki |
| Kenichiro Mizohata | University of Helsinki |
| Mikko J. Heikkilä | University of Helsinki |
| Jyrki Räisänen | University of Helsinki |
| Mikko K. Ritala | University of Helsinki |
| Markku A. Leskelä | University of Helsinki |
Films
Plasma TiN
Film/Plasma Properties
Substrates
| Silicon |
Keywords
Notes
| TiN layer used as barrier to prevent Li diffusion into substrate. |
| 1022 |