Search 1536 plasma ALD publications by:
Search 1536 plasma ALD publications by:
Publication Information
Title:
Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
Type:
Journal
Info:
Chem. Mater. 2017, 29, 998-1005
Date:
2017-01-09
Author Information
Name | Institution |
---|---|
Elisa Atosuo | University of Helsinki |
Miia Mäntymäki | University of Helsinki |
Kenichiro Mizohata | University of Helsinki |
Mikko J. Heikkilä | University of Helsinki |
Jyrki Räisänen | University of Helsinki |
Mikko K. Ritala | University of Helsinki |
Markku A. Leskelä | University of Helsinki |
Films
Plasma TiN
Film/Plasma Properties
Substrates
Silicon |
Keywords
Notes
TiN layer used as barrier to prevent Li diffusion into substrate. |
1022 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |