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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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Mikko K. Ritala Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Mikko K. Ritala returned 15 record(s).

NumberTitle
1Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
2Deposition of copper by plasma-enhanced atomic layer deposition using a novel N-Heterocyclic carbene precursor
3Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
4Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage
5Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates
6Radical Enhanced Atomic Layer Deposition of Titanium Dioxide - Thesis Coverage
7Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates - Thesis Coverage
8Radical Enhanced Atomic Layer Deposition of Tantalum Oxide - Thesis Coverage
9Low-Temperature Deposition of Aluminum Oxide by Radical Enhanced Atomic Layer Deposition - Thesis Coverage
10Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
11Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
12Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
13Radical Enhanced Atomic Layer Deposition of Titanium Dioxide
14MANOS performance dependence on ALD Al2O3 oxidation source
15Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors