Film Uniformity in Atomic Layer Deposition

Type:
Journal
Info:
Chem. Vap. Deposition 2006, 12, 13-24
Date:
2005-10-05

Author Information

Name Institution
Kai-Erik ElersASM Microchemistry Oy
Tom BlombergASM Microchemistry Oy
M. PeussaVTI Technologies Oy
B. AitchisonMLD Technologies, LLC
Suvi HaukkaASM Microchemistry Oy
Steven MarcusASM Microchemistry Oy

Films


Film/Plasma Properties

Characteristic: Uniformity
Analysis: -

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Substrates

Notes

1307