Publication Information

Title: Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition

Type: Journal

Info: Thin Solid Films 628 (2017) 142 - 147

Date: 2017-03-17

DOI: https://doi.org/10.1016/j.tsf.2017.03.025

Author Information

Name

Institution

University of Rijeka

University of Rijeka

University of Rijeka

University of Rijeka

Institute of Physics

University of Rijeka

Films

Plasma TiO2 using Beneq TFS-200

Deposition Temperature Range = 40-250C

7550-45-0

7782-44-7

Thermal TiO2 using Beneq TFS-200

Deposition Temperature Range = 100-250C

7550-45-0

7732-18-5

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Silicon

Keywords

Notes

Based on poster and paper abstract

1134



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