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Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 628 (2017) 142 - 147
Date:
2017-03-17
Author Information
| Name | Institution |
|---|---|
| Iva Saric | University of Rijeka |
| Robert Peter | University of Rijeka |
| Ivna Kavre Piltaver | University of Rijeka |
| Ivana Jelovica Badovinac | University of Rijeka |
| Kresimir Salamon | Institute of Physics |
| Mladen Petravic | University of Rijeka |
Films
Plasma TiO2
Thermal TiO2
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Silicon |
Notes
| Based on poster and paper abstract |
| 1134 |