Publication Information

Title:
Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
Type:
Journal
Info:
Thin Solid Films 628 (2017) 142 - 147
Date:
2017-03-17

Author Information

Name Institution
Iva SaricUniversity of Rijeka
Robert PeterUniversity of Rijeka
Ivna Kavre PiltaverUniversity of Rijeka
Ivana Jelovica BadovinacUniversity of Rijeka
Kresimir SalamonInstitute of Physics
Mladen PetravicUniversity of Rijeka

Films

Plasma TiO2


Thermal TiO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon

Keywords

Notes

Based on poster and paper abstract
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