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Publication Information

Title: Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition

Type: Poster

Info: JVC-16, EVC-14, CroSloVM-23 2016, Portoro┼ż

Date: 2016-05-01

DOI: http://dx.doi.org/10.13140/RG.2.2.36222.38721

Author Information

Name

Institution

University of Rijeka

University of Rijeka

University of Rijeka

University of Rijeka

University of Rijeka

Films

Thermal TiO2 using Beneq TFS-200

Deposition Temperature Range = 100-250C

7550-45-0

7732-18-5

Plasma TiO2 using Beneq TFS-200

Deposition Temperature Range = 40-250C

7550-45-0

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Images

SEM, Scanning Electron Microscopy

Unknown

Substrates

Silicon

Keywords

Notes

1024



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