Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition

Type:
Poster
Info:
JVC-16, EVC-14, CroSloVM-23 2016, Portoro┼ż
Date:
2016-05-01

Author Information

Name Institution
Iva SaricUniversity of Rijeka
Robert PeterUniversity of Rijeka
Ivna Kavre PiltaverUniversity of Rijeka
Ivana Jelovica BadovinacUniversity of Rijeka
Mladen PetravicUniversity of Rijeka

Films

Thermal TiO2


Plasma TiO2


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy

Substrates

Silicon

Keywords

Notes

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