Publication Information

Title:
The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
Type:
Journal
Info:
J. Phys. D: Appl. Phys. 50 095201
Date:
2017-01-16

Author Information

Name Institution
Mari NapariUniversity of Jyväskylä
O. TarvainenUniversity of Jyväskylä
Sami KinnunenUniversity of Jyväskylä
Kai ArstilaUniversity of Jyväskylä
Jaakko JulinUniversity of Jyväskylä
Ø. S. FjellvågUniversity of Oslo
K. WeibyeUniversity of Oslo
O. NilsenUniversity of Oslo
Timo SajavaaraUniversity of Jyväskylä

Films

Plasma ZnO


Plasma TiO2


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: HIM, Helium Ion Microscopy

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Substrates

Si with native oxide

Keywords

Notes

1402