
Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
Type:
Conference Proceedings
Info:
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment Volume 831, 2016, Pages 2 - 6
Date:
2016-03-11
Author Information
Name | Institution |
---|---|
J. Härkönen | Helsinki Institute of Physics |
Jennifer Ott | Helsinki Institute of Physics |
Maarit Mäkelä | University of Hamburg |
T. Arsenovich | Helsinki Institute of Physics |
A. Gädda | Helsinki Institute of Physics |
T. Peltola | Helsinki Institute of Physics |
E. Tuovinen | Helsinki Institute of Physics |
P. Luukka | Helsinki Institute of Physics |
E. Tuominen | Helsinki Institute of Physics |
A. Junkes | University of Hamburg |
Jaakko T. Niinistö | University of Helsinki |
Mikko K. Ritala | University of Helsinki |
Films
Plasma TiN
Thermal Al2O3
Film/Plasma Properties
Substrates
Notes
811 |