Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Jaakko T. Niinistö Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Jaakko T. Niinistö returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1MANOS performance dependence on ALD Al2O3 oxidation source
2Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study
3Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films
4Large-area plasmonic hot-spot arrays: sub-2 nm interparticle separations with plasma-enhanced atomic layer deposition of Ag on periodic arrays of Si nanopillars
5Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
6Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors