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Publication Information

Title: Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films

Type: Journal

Info: Chem. Mater., 2011, 23 (11), pp 2901–2907

Date: 2011-04-20

DOI: http://dx.doi.org/10.1021/cm200402j

Author Information

Name

Institution

University of Helsinki

University of Helsinki

University of Helsinki

University of Helsinki

University of Jyväskylä

University of Helsinki

University of Helsinki

Films

Plasma Ag using Beneq TFS-200

Deposition Temperature Range = 120-150C

165461-74-5

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Oxford INCA 350 Energy Spectrometer

Thickness

EDS, EDX, Energy Dispersive X-ray Spectroscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

Hitachi S-4800 Field Emission Scanning Electron Microscope

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Veeco Instruments Nanoscope V

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Xpert PRO MPD X-ray Diffractometer

Resistivity, Sheet Resistance

Four-point Probe

Keithley 2400 Source Meter

Resistivity, Sheet Resistance

Four-point Probe

Cascade Microtech Four-Point Probe

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Unknown

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

Unknown

Substrates

soda lime glass

Si(100)

Keywords

Plasma-Enhanced Atomic Layer Deposition

Silver Beta-diketonates

Silver Thin Films

Plasmonics

PEALD Film Development

Notes

Aeronex Gatekeeper gas purifier used

Entegris Gatekeeper gas purifier used

2



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