Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
Type:
Journal
Info:
Chem. Mater., 2011, 23 (11), pp 2901–2907
Date:
2011-04-20
Author Information
| Name | Institution |
|---|---|
| Maarit I. Kariniemi | University of Helsinki |
| Jaakko T. Niinistö | University of Helsinki |
| Timo T. Hatanpää | University of Helsinki |
| Marianna Kemell | University of Helsinki |
| Timo Sajavaara | University of Jyväskylä |
| Mikko K. Ritala | University of Helsinki |
| Markku A. Leskelä | University of Helsinki |
Films
Plasma Ag
Film/Plasma Properties
Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Substrates
| soda lime glass |
| Si(100) |
Notes
| Aeronex Gatekeeper gas purifier used |
| Entegris Gatekeeper gas purifier used |
| 2 |