Publication Information

Title:
Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films
Type:
Journal
Info:
Chem. Mater., 2011, 23 (11), pp 2901–2907
Date:
2011-04-20

Author Information

Name Institution
Maarit I. KariniemiUniversity of Helsinki
Jaakko T. NiinistöUniversity of Helsinki
Timo T. HatanpääUniversity of Helsinki
Marianna KemellUniversity of Helsinki
Timo SajavaaraUniversity of Jyväskylä
Mikko K. RitalaUniversity of Helsinki
Markku A. LeskeläUniversity of Helsinki

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Thickness
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Substrates

soda lime glass
Si(100)

Keywords

Plasma-Enhanced Atomic Layer Deposition
Silver Beta-diketonates
Silver Thin Films
Plasmonics
PEALD Film Development

Notes

Aeronex Gatekeeper gas purifier used
Entegris Gatekeeper gas purifier used
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