Search Plasma ALD Publication Database By...

Publication Information

Title: Atomic layer deposition of TiN for the fabrication of nanomechanical resonators

Type: Journal

Info: J. Vac. Sci. Technol. A 32(2), Mar/Apr 2012, 021503

Date: 2013-03-01

DOI: http://dx.doi.org/10.116/1.4790132

Author Information

Name

Institution

University of Alberta

University of Alberta

University of Alberta

National Institute for Nanotechnology, Alberta, Canada

National Institute for Nanotechnology, Alberta, Canada

University of Alberta

University of Alberta

Films

Deposition Temperature Range = 120-300C

7550-45-0

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam VASE

Thickness

Reflectometry

Filmetrics F-50

Film Stress

Interferometry

Flexus 2320 Thin Film Stress Measurement System

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Bruker D8 Discover

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Kratos Analytical Axis Ultra DLD

Substrates

Si(100)

Keywords

Cantilever

PEALD Film Development

Notes

Pirahna clean

14



Shortcuts



© 2014-2018 plasma-ald.com