Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(2), Mar/Apr 2012, 021503
Date:
2013-03-01
Author Information
| Name | Institution |
|---|---|
| Nathan Nelson-Fitzpatrick | University of Alberta |
| Csaba Guthy | University of Alberta |
| Somayyeh Poshtiban | University of Alberta |
| Eric Finley | National Institute for Nanotechnology, Alberta, Canada |
| Kenneth D. Harris | National Institute for Nanotechnology, Alberta, Canada |
| Brian J. Worfolk | University of Alberta |
| Stephane Evoy | University of Alberta |
Films
Plasma TiN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Thickness
Analysis: Reflectometry
Characteristic: Film Stress
Analysis: Interferometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
Notes
| Pirahna clean |
| 14 |