Publication Information

Title:
Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
Type:
Journal
Info:
J. Vac. Sci. Technol. A 32(2), Mar/Apr 2012, 021503
Date:
2013-03-01

Author Information

Name Institution
Nathan Nelson-FitzpatrickUniversity of Alberta
Csaba GuthyUniversity of Alberta
Somayyeh PoshtibanUniversity of Alberta
Eric FinleyNational Institute for Nanotechnology, Alberta, Canada
Kenneth D. HarrisNational Institute for Nanotechnology, Alberta, Canada
Brian J. WorfolkUniversity of Alberta
Stephane EvoyUniversity of Alberta

Films

Plasma TiN


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Thickness
Analysis: Reflectometry

Characteristic: Film Stress
Analysis: Interferometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(100)

Keywords

Cantilever
PEALD Film Development

Notes

Pirahna clean
14