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Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Physics Letters 86, 071919 (2005)
Date:
2004-12-20
Author Information
| Name | Institution |
|---|---|
| Yong Ju Lee | Lawrence Berkeley National Laboratory |
| Sang-Won Kang | Korea Advanced Institute of Science and Technology |
Films
Plasma AlN
Plasma TiN
Plasma TiAlN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Substrates
| SiO2 |
Notes
| 1183 |