Publication Information

Title:
Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Applied Physics Letters 86, 071919 (2005)
Date:
2004-12-20

Author Information

Name Institution
Yong Ju LeeLawrence Berkeley National Laboratory
Sang-Won KangKorea Advanced Institute of Science and Technology

Films




Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Substrates

SiO2

Keywords

Oxidation Resistance

Notes

1183