Yong Ju Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Yong Ju Lee returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
2Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
3Formation of aluminum nitride thin films as gate dielectrics on Si(100)
4Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
5Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
6Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN
7Study on the characteristics of aluminum thin films prepared by atomic layer deposition
8Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition