Yong Ju Lee Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Yong Ju Lee returned 8 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
2Atomic layer deposition of aluminum thin films using an alternating supply of trimethylaluminum and a hydrogen plasma
3Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
4Formation of aluminum nitride thin films as gate dielectrics on Si(100)
5Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
6Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
7Study on the characteristics of aluminum thin films prepared by atomic layer deposition
8Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN