Title: Study on the characteristics of aluminum thin films prepared by atomic layer deposition
Type: Journal
Info: J. Vac. Sci. Technol. A 20(6), Nov/Dec 2002
Date: 2002-11-01
DOI: http://dx.doi.org/10.1116/1.1513636
Name
Institution
Korea Advanced Institute of Science and Technology
Korea Advanced Institute of Science and Technology
Characteristic
Analysis
Diagnostic
Thickness
Profilometry
Tencor Alpha-Step Profilometer
Thickness
TEM, Transmission Electron Microscope
Unknown
Resistivity, Sheet Resistance
Four-point Probe
Unknown
Conformality, Step Coverage
SEM, Scanning Electron Microscopy
Unknown
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Unknown
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
XRD, X-Ray Diffraction
Unknown
Chemical Composition, Impurities
AES, Auger Electron Spectroscopy
Unknown
TiN
Interconnect
Description of why TMA forms dimer.
TMA vapor pressure = 1117 Pa at room T.
Pyrolytic decomposition temperature >350C with references.
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