Publication Information

Title:
Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3-Ar-H2 plasma treatment for capacitor electrodes
Type:
Journal
Info:
Materials Letters, Volume 59, Pages 615 - 617
Date:
2004-09-21

Author Information

Name Institution
Yong Ju LeeLawrence Berkeley National Laboratory

Films


Film/Plasma Properties

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Substrates

SiO2

Keywords

Notes

1256