AlCl3, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈAluminum chloride
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous (99.99+%-Al) PURATREM
3Alfa AesarπŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous, 99.999% (metals basis)
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺAluminumtrichloride
5Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous, powder, 99.999% trace metals basis
6TCIπŸ‡ΊπŸ‡ΈAluminum(III) Chloride
7Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous
8Pegasus ChemicalsπŸ‡¬πŸ‡§Aluminium chloride

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
2Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
3Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
4Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
5Formation of aluminum nitride thin films as gate dielectrics on Si(100)
6Radical Enhanced Atomic Layer Deposition of Metals and Oxides
7Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
8Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
9Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition