AlCl₃, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

Number	Website
1	http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

Number	Vendor	Link
1	Strem Chemicals, Inc.	Aluminum chloride, anhydrous (99.99+%-Al) PURATREM
2	Ereztech	Aluminum chloride, anhydrous (99.99%-Al)

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

Number	Title
1	Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
3	Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
4	Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
5	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
6	Formation of aluminum nitride thin films as gate dielectrics on Si(100)
7	Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
8	Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition

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