AlCl3, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

NumberVendorLink
1Santa Cruz BiotechnologyAluminum chloride anhydrous
2TCIAluminum(III) Chloride
3Alfa AesarAluminum chloride, anhydrous, 99.999% (metals basis)
4Strem Chemicals, Inc.Aluminum chloride, anhydrous (99.99+%-Al) PURATREM
5Sigma-Aldrich, Co. LLCAluminum chloride anhydrous, powder, 99.999% trace metals basis
6EreztechAluminum chloride

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides
2Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
3Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
4Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
5Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
6Formation of aluminum nitride thin films as gate dielectrics on Si(100)
7Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
8Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
9Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition