|1||Ereztech||Aluminum chloride, anhydrous (99.99%-Al)|
|2||Strem Chemicals, Inc.||Aluminum chloride, anhydrous (99.99+%-Al) PURATREM|
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Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|2||Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition|
|3||Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma|
|4||Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films|
|5||Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition|
|6||Formation of aluminum nitride thin films as gate dielectrics on Si(100)|
|7||Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition|
|8||Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition|
|9||Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition|
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