AlCl3, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈAluminum chloride
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous (99.99+%-Al) PURATREM
3DOCK/CHEMICALSπŸ‡©πŸ‡ͺAluminumtrichloride
4TCIπŸ‡ΊπŸ‡ΈAluminum(III) Chloride
5Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous, powder, 99.999% trace metals basis
6Pegasus ChemicalsπŸ‡¬πŸ‡§Aluminium chloride
7Alfa AesarπŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous, 99.999% (metals basis)
8Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
2Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
3Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
4Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
5Radical Enhanced Atomic Layer Deposition of Metals and Oxides
6Formation of aluminum nitride thin films as gate dielectrics on Si(100)
7Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
8Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
9Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition