AlCl3, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

NumberVendorRegionLink
1TCIπŸ‡ΊπŸ‡ΈAluminum(III) Chloride
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous (99.99+%-Al) PURATREM
3DOCK/CHEMICALSπŸ‡©πŸ‡ͺAluminumtrichloride
4Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous, powder, 99.999% trace metals basis
5Pegasus ChemicalsπŸ‡¬πŸ‡§Aluminium chloride
6EreztechπŸ‡ΊπŸ‡ΈAluminum chloride
7Alfa AesarπŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous, 99.999% (metals basis)
8Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
2Radical Enhanced Atomic Layer Deposition of Metals and Oxides
3Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
4Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
5Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
6Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
7Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
8Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
9Formation of aluminum nitride thin films as gate dielectrics on Si(100)