|1||Sigma-Aldrich, Co. LLC||Aluminum chloride anhydrous, powder, 99.999% trace metals basis|
|2||Alfa Aesar||Aluminum chloride, anhydrous, 99.999% (metals basis)|
|3||Strem Chemicals, Inc.||Aluminum chloride, anhydrous (99.99+%-Al) PURATREM|
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Your search for publications using this chemistry returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
|2||Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma|
|3||Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films|
|4||Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition|
|5||Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition|
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