AlCl3, Aluminum Trichloride, CAS# 7446-70-0

Informational Websites

NumberWebsite
1http://webbook.nist.gov/cgi/cbook.cgi?ID=7446-70-0

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈAluminum chloride
2Alfa AesarπŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous, 99.999% (metals basis)
3Santa Cruz BiotechnologyπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous
4Strem Chemicals, Inc.πŸ‡ΊπŸ‡ΈAluminum chloride, anhydrous (99.99+%-Al) PURATREM
5Pegasus ChemicalsπŸ‡¬πŸ‡§Aluminium chloride
6DOCK/CHEMICALSπŸ‡©πŸ‡ͺAluminumtrichloride
7TCIπŸ‡ΊπŸ‡ΈAluminum(III) Chloride
8Sigma-Aldrich, Co. LLCπŸ‡ΊπŸ‡ΈAluminum chloride anhydrous, powder, 99.999% trace metals basis

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Blistering mechanisms of atomic-layer-deposited AlN and Al2O3 films
2Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
3Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
4Formation of aluminum nitride thin films as gate dielectrics on Si(100)
5Growth of aluminum nitride thin films prepared by plasma-enhanced atomic layer deposition
6Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
7Atomic layer deposition of AlN from AlCl3 using NH3 and Ar/NH3 plasma
8Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
9Radical Enhanced Atomic Layer Deposition of Metals and Oxides