Your search for plasma enhanced atomic layer deposition publications discussing TiAlN films returned 5 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition|
|2||Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition|
|3||Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition|
|4||Semiconductor-like nanofilms assembled with AlN and TiN laminations for nearly ideal graphene-based heterojunction devices|
|5||Ti-Al-N Thin Films Prepared by the Combination of Metallorganic Plasma-Enhanced Atomic Layer Deposition of Al and TiN|
© 2014-2019 plasma-ald.com