Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Journal of Materials Science & Technology Volume 33, Issue 3, Pages 295-299
Date:
2016-05-24
Author Information
| Name | Institution |
|---|---|
| Eun-Young Yun | Pusan National University |
| Woo-Jae Lee | Pusan National University |
| Qi Min Wang | Guangdong University of Technology |
| Se-Hun Kwon | Pusan National University |
Films
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Corrosion
Analysis: Potentiodynamic Polarization Test
Substrates
| Stainless Steel 316L |
Notes
| 929 |