Publication Information

Title: Electrical and Corrosion Properties of Titanium Aluminum Nitride Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition

Type: Journal

Info: Journal of Materials Science & Technology Volume 33, Issue 3, Pages 295-299

Date: 2016-05-24

DOI: https://doi.org/10.1016/j.jmst.2016.11.027

Author Information

Name

Institution

Pusan National University

Pusan National University

Guangdong University of Technology

Pusan National University

Films

Plasma TiAlN using Unknown

Deposition Temperature = 200C

3275-24-9

75-24-1

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Resistivity, Sheet Resistance

Unknown

-

Corrosion

Potentiodynamic Polarization Test

-

Substrates

Stainless Steel 316L

Keywords

Corrosion

Notes

929



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