Publication Information

Title:
Atomic Layer Deposition of TiN/Al2O3/TiN Nanolaminates for Capacitor Applications
Type:
Conference Proceedings
Info:
ECS Transactions, 50 (13) 151-157 (2013)
Date:
2012-06-01

Author Information

Name Institution
Loïc AssaudAix-Marseille Université
Margrit HanbückenAix-Marseille Université
Lionel SantinacciAix-Marseille Université

Films

Thermal Al2O3




Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Substrates

Si(100)

Keywords

Plasma vs Thermal Comparison

Notes

1367