Publication Information

Title: Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material

Type: Presentation

Info: ALD 2012 Talk

Date: 2012-06-18

DOI: No DOI

Author Information

Name

Institution

Yeungnam University

Yeungnam University

Daegu Gyeongbuk Institute of Science & Technology

Films

Deposition Temperature Range N/A

36945-13-8

1333-74-0

Deposition Temperature Range N/A

36945-13-8

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

XRR, X-Ray Reflectivity

-

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

-

Resistivity, Sheet Resistance

Unknown

-

Conformality, Step Coverage

TEM, Transmission Electron Microscope

-

Diffusion Barrier Properties

Anneal

-

Substrates

Silicon

Keywords

Diffusion Barrier

Notes

Samples annealed 700-1000C, 5e-6Torr, 30min.

90



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