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Publication Information

Title: Plasma-enhanced atomic layer deposition of TiCx films using tetrakis neopentyl titanium and applications to a diffusion barrier and contact material

Type: Presentation

Info: ALD 2012 Talk

Date: 2012-06-18

DOI: No DOI

Author Information

Name

Institution

Yeungnam University

Yeungnam University

Daegu Gyeongbuk Institute of Science & Technology

Films

Deposition Temperature Range N/A

36945-13-8

1333-74-0

Deposition Temperature Range N/A

36945-13-8

7727-37-9

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

XRR, X-Ray Reflectivity

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Unknown

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

TEM, Transmission Electron Microscope

Unknown

Resistivity, Sheet Resistance

Unknown

Unknown

Conformality, Step Coverage

TEM, Transmission Electron Microscope

Unknown

Diffusion Barrier Properties

Anneal

Unknown

Substrates

Silicon

Keywords

Diffusion Barrier

Notes

Samples annealed 700-1000C, 5e-6Torr, 30min.

90



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