Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Supercond. Sci. Technol. 30 (2017) 095010
Date:
2017-06-30

Author Information

Name Institution
Yonas YemaneStanford University
Mark J. SowaCambridge NanoTech
Jinsong ZhangStanford University
Ling JuLehigh University
Eric W. DegunsCambridge NanoTech
Nicholas C. StrandwitzLehigh University
Fritz B. PrinzStanford University
J ProvineStanford University

Films




Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Superconductivity
Analysis: Four-point Probe

Characteristic: Magnetization
Analysis: Magnetization

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Substrates

Silicon
SiO2

Notes

1027