Publication Information

Title: Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition

Type: Journal

Info: Supercond. Sci. Technol. 30 (2017) 095010

Date: 2017-06-30

DOI: https://doi.org/10.1088/1361-6668/aa7ce3

Author Information

Name

Institution

Stanford University

Cambridge NanoTech

Stanford University

Lehigh University

Cambridge NanoTech

Lehigh University

Stanford University

Stanford University

Films

Deposition Temperature = 300C

210363-27-2

7727-37-9

1333-74-0

Deposition Temperature = 300C

210363-27-2

3275-24-9

7727-37-9

1333-74-0

Deposition Temperature = 300C

3275-24-9

7727-37-9

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

Horiba Jobin Yvon UVISEL

Refractive Index

Ellipsometry

Horiba Jobin Yvon UVISEL

Extinction Coefficient

Ellipsometry

Horiba Jobin Yvon UVISEL

Resistivity, Sheet Resistance

Four-point Probe

Lucas Labs 302

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

PHI VersaProbe 5000

Superconductivity

Four-point Probe

Stanford Research Systems SR830

Magnetization

Magnetization

Quantum Design MPMS

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

PANalytical Empyrean

Density

XRR, X-Ray Reflectivity

PANalytical Empyrean

Substrates

Silicon

SiO2

Keywords

Superconductor

Notes

1027



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