Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Supercond. Sci. Technol. 30 (2017) 095010
Date:
2017-06-30
Author Information
| Name | Institution |
|---|---|
| Yonas Yemane | Stanford University |
| Mark J. Sowa | Cambridge NanoTech |
| Jinsong Zhang | Stanford University |
| Ling Ju | Lehigh University |
| Eric W. Deguns | Cambridge NanoTech |
| Nicholas C. Strandwitz | Lehigh University |
| Fritz B. Prinz | Stanford University |
| J Provine | Stanford University |
Films
Plasma NbN
Plasma NbTiN
Plasma TiN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Superconductivity
Analysis: Four-point Probe
Characteristic: Magnetization
Analysis: Magnetization
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Substrates
| Silicon |
| SiO2 |
Notes
| 1027 |