TBTDEN, Tris(diethylamido)(tert-butylimido)niobium, CAS# 210363-27-2

Where to buy

NumberVendorLink
1EreztechTris(diethylamido) (tert-butylimido) niobium(V)
2Strem Chemicals, Inc.(t-Butylimido)tris(diethylamino)niobium(V), min. 98%

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 15 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
2Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
3Atomic Layer Deposition of Niobium Nitride from Different Precursors
4Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
5Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
6Performance of Samples with Novel SRF Materials and Growth Techniques
7Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
8Plasma-enhanced atomic layer deposition of superconducting niobium nitride
9Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
10Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
11Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
12Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
13Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
14Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
15Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition