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TBTDEN, Tris(diethylamido)(tert-butylimido)niobium, CAS# 210363-27-2

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NumberVendorLink
1Strem Chemicals, Inc.(t-Butylimido)tris(diethylamino)niobium(V), min. 98%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 7 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition of Niobium Nitride from Different Precursors
2Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
3Plasma-enhanced atomic layer deposition of superconducting niobium nitride
4Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
5Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
6Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
7Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition

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