TBTDEN, Tris(diethylamido)(tert-butylimido)niobium, CAS# 210363-27-2

Where to buy

NumberVendorRegionLink
1EreztechπŸ‡ΊπŸ‡ΈTris(diethylamido) (tert-butylimido) niobium(V)
2Strem Chemicals, Inc.πŸ‡ΊπŸ‡Έ(t-Butylimido)tris(diethylamino)niobium(V), min. 98%
3Pegasus ChemicalsπŸ‡¬πŸ‡§Tris(diethylamido)(tert-butylimido)niobium
4DOCK/CHEMICALSπŸ‡©πŸ‡ͺ(Tert-Butylimido)tris(diethylamido)niobium

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 18 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
2Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
3Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
4Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
5Performance of Samples with Novel SRF Materials and Growth Techniques
6Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
7Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
8Atomic Layer Deposition of Niobium Nitride from Different Precursors
9Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
10Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
11A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
12Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
13Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
14Plasma-enhanced atomic layer deposition of superconducting niobium nitride
15Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
16In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications
17Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
18Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators