TBTDEN, Tris(diethylamido)(tert-butylimido)niobium, CAS# 210363-27-2

Where to buy

NumberVendorLink
1EreztechTris(diethylamido)(tert-butylimido)niobium(V) (98%-Nb)
2Strem Chemicals, Inc.(t-Butylimido)tris(diethylamino)niobium(V), min. 98%

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Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
2Atomic Layer Deposition of Niobium Nitride from Different Precursors
3Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
4Plasma-enhanced atomic layer deposition of superconducting niobium nitride
5Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
6Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
7Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
8Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
9Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition


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