Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Performance of Samples with Novel SRF Materials and Growth Techniques

Type:
Conference Proceedings
Info:
9th International Particle Accelerator Conference, IPAC2018, Vancouver, BC, Canada
Date:
2018-04-29
DOI:
http://dx.doi.org/10.18429/JACoW-IPAC2018-WEPMF047

Author Information

Name Institution
T. OseroffCornell University
M. GeCornell University
M. LiepeCornell University
J. T. ManiscalcoCornell University
R. D. PorterCornell University
S. McNealUltramet
Mark J. SowaVeeco Instruments

Films

Plasma NbN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
Where to buy precursor
H2, Hydrogen
CAS#: 1333-74-0

Where to buy onsite generators

N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Superconductivity
Analysis: Custom
Diagnostic: Custom

Substrates

Nb

Notes

1596