NbN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing NbN films returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
2Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
3Plasma-enhanced ALD system for SRF cavity
4Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
5Plasma-enhanced atomic layer deposition of superconducting niobium nitride
6Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
7Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
8Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
9RF Characterization of Novel Superconducting Materials and Multilayers
10Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
11Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
12Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
13Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
14Atomic Layer Deposition of Niobium Nitride from Different Precursors
15Performance of Samples with Novel SRF Materials and Growth Techniques
16Tribological properties of thin films made by atomic layer deposition sliding against silicon
17Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
18Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
19A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
20Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks