NbN Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing NbN films returned 20 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators
2Plasma-enhanced atomic layer deposition of superconducting niobium nitride
3Atomic Layer Deposition of Niobium Nitride from Different Precursors
4Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
5Performance of Samples with Novel SRF Materials and Growth Techniques
6Superconducting Characteristics of NbN Films Deposited by Atomic Layer Deposition
7Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices
8Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
9RF Characterization of Novel Superconducting Materials and Multilayers
10Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN
11Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
12Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
13A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
14Infrared single-photon sensitivity in atomic layer deposited superconducting nanowires
15Plasma-Enabled ALD of Niobium Nitride Using an Organometallic Nb Precursor
16Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
17Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
18Tribological properties of thin films made by atomic layer deposition sliding against silicon
19Plasma-enhanced ALD system for SRF cavity
20Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition