Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Plasma-enhanced ALD system for SRF cavity

Type:
Conference Proceedings
Info:
18th International Conference on RF Superconductivity
Date:
2017-07-17
DOI:
http://dx.doi.org/10.18429/JACoW-SRF2017-THPB055

Author Information

Name Institution
S. KatoHigh Energy Accelerator Research Organization (KEK)
H. HayanoHigh Energy Accelerator Research Organization (KEK)

Films

Plasma NbN

Hardware used: Custom Remote Inductively Coupled Plasma
Nb(N-tBu)(NMeEt)3, TBTMEN
CAS#: 864150-47-0
Where to buy precursor
NH3, Ammonia
CAS#: 7664-41-7
Where to buy precursor
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Compositional Depth Profiling
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Substrates

Silicon

Notes

1116