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Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Supercond. Sci. Technol. 26 025008, 2013
Date:
2012-11-23
Author Information
| Name | Institution |
|---|---|
| Mario Ziegler | Leibniz Institute of Photonic Technology |
| Ludwig Fritzsch | Leibniz Institute of Photonic Technology |
| Julia Day | Leibniz Institute of Photonic Technology |
| Sven Linzen | Leibniz Institute of Photonic Technology |
| Solveig Anders | Leibniz Institute of Photonic Technology |
| Julia Toussaint | Leibniz Institute of Photonic Technology |
| Hans-Georg Meyer | Leibniz Institute of Photonic Technology |
Films
Plasma NbN
Film/Plasma Properties
Characteristic: Critical Temperature
Analysis: Four-point Probe
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Thickness
Analysis: Profilometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Al2O3 |
Notes
| 629 |