Publication Information

Title: Superconducting niobium nitride thin films deposited by metal organic plasma-enhanced atomic layer deposition

Type: Journal

Info: Supercond. Sci. Technol. 26 025008, 2013

Date: 2012-11-23

DOI: http://dx.doi.org/10.1088/0953-2048/26/2/025008

Author Information

Name

Institution

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Leibniz Institute of Photonic Technology

Films

Deposition Temperature Range = 200-400C

210363-27-2

1333-74-0

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Critical Temperature

Four-point Probe

Custom

Resistivity, Sheet Resistance

Four-point Probe

Custom

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Thickness

Profilometry

Dektak

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Substrates

Al2O3

Keywords

Superconductor

Notes

629



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