Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate

Type:
Journal
Info:
Supercond. Sci. Technol. 34 (2021) 085016
Date:
2021-06-11

Author Information

Name Institution
Max V. ShibalovRussian Academy of Sciences
A. M. MumlyakovRussian Academy of Sciences
I. V. TrofimovRussian Academy of Sciences
E. R. TimofeevaRussian Academy of Sciences
A. P. SirotinaRussian Academy of Sciences
E. A. PershinaRussian Academy of Sciences
A. M. TagachenkovRussian Academy of Sciences
Y. V. AnufrievRussian Academy of Sciences
E. V. ZenovaRussian Academy of Sciences
N. V. PorokhovRussian Academy of Sciences
Michael A. TarkhovRussian Academy of Sciences

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Critical Temperature
Analysis: Custom

Characteristic: Critical Current Density
Analysis: Custom

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Substrates

SiO2

Keywords

Superconductor

Notes

1580