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Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate
Type:
Journal
Info:
Supercond. Sci. Technol. 34 (2021) 085016
Date:
2021-06-11
Author Information
| Name | Institution |
|---|---|
| Max V. Shibalov | Russian Academy of Sciences |
| A. M. Mumlyakov | Russian Academy of Sciences |
| I. V. Trofimov | Russian Academy of Sciences |
| E. R. Timofeeva | Russian Academy of Sciences |
| A. P. Sirotina | Russian Academy of Sciences |
| E. A. Pershina | Russian Academy of Sciences |
| A. M. Tagachenkov | Russian Academy of Sciences |
| Y. V. Anufriev | Russian Academy of Sciences |
| E. V. Zenova | Russian Academy of Sciences |
| N. V. Porokhov | Russian Academy of Sciences |
| Michael A. Tarkhov | Russian Academy of Sciences |
Films
Plasma NbN
Film/Plasma Properties
Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Critical Temperature
Analysis: Custom
Characteristic: Critical Current Density
Analysis: Custom
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Substrates
| SiO2 |
Notes
| 1580 |