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An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
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I. V. Trofimov Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by I. V. Trofimov returned 3 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Dielectric properties investigation of a compound based on atomic layer deposited multi-layer structure
2A Study of Ultrathin Superconducting Films of Niobium Nitride Obtained by Atomic Layer Deposition
3Multistep atomic layer deposition process for ultrathin superconducting NbN films with high critical current density on amorphous substrate