Publication Information

Title:
Atomic Layer Deposition of Niobium Nitride from Different Precursors
Type:
Conference Proceedings
Info:
Proceedings of IPAC2017, Copenhagen, Denmark
Date:
2017-05-14

Author Information

Name Institution
P. PizzolASTeC, STFC Daresbury Laboratory
J. W. RobertsUniversity of Liverpool
Jacqueline S. WrenchUniversity of Liverpool
O.B. MalyshevASTeC, STFC Daresbury Laboratory
R. ValizadehASTeC, STFC Daresbury Laboratory
Paul R. ChalkerUniversity of Liverpool

Films

Plasma NbN


Plasma NbN



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Si(100)

Keywords

Precursor Comparison

Notes

TBTDEN temperature tested.
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