Atomic Layer Deposition of Niobium Nitride from Different Precursors
Type:
Conference Proceedings
Info:
Proceedings of IPAC2017, Copenhagen, Denmark
Date:
2017-05-14
Author Information
| Name | Institution |
|---|---|
| P. Pizzol | ASTeC, STFC Daresbury Laboratory |
| Joseph W. Roberts | University of Liverpool |
| Jacqueline S. Wrench | University of Liverpool |
| O.B. Malyshev | ASTeC, STFC Daresbury Laboratory |
| R. Valizadeh | ASTeC, STFC Daresbury Laboratory |
| Paul R. Chalker | University of Liverpool |
Films
Plasma NbN
Plasma NbN
Plasma NbN
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Si(100) |
Notes
| TBTDEN temperature tested. |
| 984 |