The publication database currently has 1700 entries.
Use Advanced Search for more complex searches
Innatiux is a retained executive recruiting firm with a focus on the search and placement of proven leaders for client companies in the field of high-tech capital equipment and analytical instrumentation. We are seeking WW technical and business leaders with a background in semiconductor deposition to fill confidential senior and executive level positions with our clients. Visit us at: www.innatiux.com
Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
Type:
Journal
Info:
Superconductor Science and Technology, Volume 30, Number 3
Date:
2016-09-28
Author Information
| Name | Institution |
|---|---|
| Sven Linzen | Leibniz Institute of Photonic Technology |
| Mario Ziegler | Leibniz Institute of Photonic Technology |
| O V Astafiev | University of London |
| M Schmelz | Leibniz Institute of Photonic Technology |
| Uwe Hübner | Leibniz Institute of Photonic Technology |
| Marco Diegel | Leibniz Institute of Photonic Technology |
| Evgeni Il'ichev | Leibniz Institute of Photonic Technology |
| Hans-Georg Meyer | Leibniz Institute of Photonic Technology |
Films
Plasma NbN
Film/Plasma Properties
Characteristic: Thickness
Analysis: -
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Resistivity, Sheet Resistance
Analysis: -
Characteristic: Critical Temperature
Analysis: -
Characteristic: Critical Current Density
Analysis: -
Substrates
| SiO2 |
Notes
| 1151 |