Publication Information

Title:
Structural and electrical properties of ultrathin niobium nitride films grown by atomic layer deposition
Type:
Journal
Info:
Superconductor Science and Technology, Volume 30, Number 3
Date:
2016-09-28

Author Information

Name Institution
Sven LinzenLeibniz Institute of Photonic Technology
Mario ZieglerLeibniz Institute of Photonic Technology
O V AstafievUniversity of London
M SchmelzLeibniz Institute of Photonic Technology
Uwe HübnerLeibniz Institute of Photonic Technology
Marco DiegelLeibniz Institute of Photonic Technology
E Il'ichevLeibniz Institute of Photonic Technology
Hans-Georg MeyerLeibniz Institute of Photonic Technology

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Resistivity, Sheet Resistance
Analysis: -

Characteristic: Critical Temperature
Analysis: -

Characteristic: Critical Current Density
Analysis: -

Substrates

SiO2

Keywords

Superconductor

Notes

1151