Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators

Type:
Journal
Info:
Journal of Low Temperature Physics volume 199, pages 875-882 (2020)
Date:
2020-01-13

Author Information

Name Institution
Calder SheagrenUniversity of Chicago
Peter S. BarryArgonne National Laboratory
Erik ShirokoffUniversity of Chicago
Qing Yang TangUniversity of Chicago

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Custom

Characteristic: Superconductivity
Analysis: Custom

Characteristic: Quality Factor
Analysis: Custom

Characteristic: Kinetic Inductance
Analysis: Custom

Substrates

Si(100)

Keywords

Superconductor

Notes

1560