Publication Information

Title:
Plasma-enhanced atomic layer deposition of superconducting niobium nitride
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B143 (2017)
Date:
2016-12-07

Author Information

Name Institution
Mark J. SowaCambridge NanoTech
Yonas YemaneStanford University
Jinsong ZhangStanford University
Johanna C. PalmstromStanford University
Sanghyun JuLehigh University
Nicholas C. StrandwitzLehigh University
Fritz B. PrinzStanford University
J ProvineStanford University

Films


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Critical Temperature
Analysis: Custom

Characteristic: Superconductivity
Analysis: Magnetization

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Substrates

Si(100)
SiO2

Keywords

Superconductor

Notes

900