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Plasma-enhanced atomic layer deposition of superconducting niobium nitride

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B143 (2017)
Date:
2016-12-07
DOI:
http://dx.doi.org/10.1116/1.4972858

Author Information

Name Institution
Mark J. SowaCambridge NanoTech
Yonas YemaneStanford University
Jinsong ZhangStanford University
Johanna C. PalmstromStanford University
Sanghyun JuLehigh University
Nicholas C. StrandwitzLehigh University
Fritz B. PrinzStanford University
J ProvineStanford University

Films

Plasma NbN

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 100-300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Lucas Labs 302

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: PHI VersaProbe 5000

Characteristic: Critical Temperature
Analysis: Custom
Diagnostic: Stanford Research Systems SR830

Characteristic: Superconductivity
Analysis: Magnetization
Diagnostic: Quantum Design MPMS

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: PANalytical Empyrean

Substrates

Si(100)
SiO2

Notes

900