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Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(4), Jul/Aug 2018
Date:
2018-05-29
Author Information
| Name | Institution |
|---|---|
| Saravana Balaji Basuvalingam | Eindhoven University of Technology |
| Bart Macco | Eindhoven University of Technology |
| Harm C. M. Knoops | Eindhoven University of Technology |
| Jimmy Melskens | Eindhoven University of Technology |
| Erwin (W.M.M.) Kessels | Eindhoven University of Technology |
| Ageeth A. Bol | Eindhoven University of Technology |
Films
Thermal Nb2O5
Plasma Nb2O5
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Uniformity
Analysis: Ellipsometry
Characteristic: Band Gap
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Substrates
| SiO2 |
Notes
| 1217 |