Publication Information

Title: Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Type: Journal

Info: J. Vac. Sci. Technol. A 36(4), Jul/Aug 2018

Date: 2018-05-29

DOI: http://dx.doi.org/10.1116/1.5034097

Author Information

Name

Institution

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Eindhoven University of Technology

Films

Deposition Temperature Range = 150-350C

210363-27-2

7732-18-5

Deposition Temperature Range = 150-350C

210363-27-2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Thickness

Ellipsometry

J.A. Woollam M-2000U

Refractive Index

Ellipsometry

J.A. Woollam M-2000U

Uniformity

Ellipsometry

J.A. Woollam M-2000U

Band Gap

Ellipsometry

J.A. Woollam M-2000U

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Bonding States

XPS, X-ray Photoelectron Spectroscopy

Thermo Scientific KA1066 spectrometer

Chemical Composition, Impurities

RBS, Rutherford Backscattering Spectrometry

-

Density

RBS, Rutherford Backscattering Spectrometry

-

Chemical Composition, Impurities

TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

-

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

GIXRD, Grazing Incidence X-Ray Diffraction

PANalytical Xpert PRO MRD X-ray Diffractometer

Substrates

SiO2

Keywords

Plasma vs Thermal Comparison

Notes

1217



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