Publication Information

Title:
Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
Type:
Journal
Info:
J. Vac. Sci. Technol. A 36(4), Jul/Aug 2018
Date:
2018-05-29

Author Information

Name Institution
Saravana Balaji BasuvalingamEindhoven University of Technology
Bart MaccoEindhoven University of Technology
Harm C. M. KnoopsEindhoven University of Technology
Jimmy MelskensEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Thermal Nb2O5


Plasma Nb2O5


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Uniformity
Analysis: Ellipsometry

Characteristic: Band Gap
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction

Substrates

SiO2

Keywords

Plasma vs Thermal Comparison

Notes

1217