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In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2020, 12 (14), pp 16639-16647
Date:
2020-03-18
DOI:
http://dx.doi.org/10.1021/acsami.0c01279

Author Information

Name Institution
Alexander Campbell KozenU.S. Naval Research Laboratory
Zachary R. RobinsonThe College at Brockport SUNY
Evan R. GlaserU.S. Naval Research Laboratory
Mark TwiggU.S. Naval Research Laboratory
Thomas LarrabeeU.S. Naval Research Laboratory
Hans ChoU.S. Naval Research Laboratory
Sharka M. ProkesU.S. Naval Research Laboratory
Laura B. RuppaltU.S. Naval Research Laboratory

Films

Thermal Nb2O5

Hardware used: Beneq TFS-200
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 200C

Other Nb2O5

Hardware used: Beneq TFS-200
TBTDEN, Tris(diethylamido)(tert-butylimido)niobium
CAS#: 210363-27-2
H2O, Water
CAS#: 7732-18-5
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000D

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Fastscan/ICON

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: Synchrotron

Characteristic: Optical Properties
Analysis: UV-VIS Spectroscopy
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Memristor Characteristics
Analysis: -
Diagnostic: -

Substrates

Sapphire
Si(100)

Notes

1629